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ieee.org
ASML Developing Next-Gen EUV Lithography
Productivity gains will continue through the next two or three chip generations, but after that we’ll need something bigger and better
Dec 5, 2018
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What role does the reticle stage play in High NA extreme ultraviolet (EUV) lithography? In this video, learn how the reticle stage enables patterning in advanced chipmaking. You’ll see how 13.5 nanometer EUV light reflected into the system gets shaped by the illuminator and how a chip pattern gets encoded into the light for lithography. | ASML
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