LONDON — Surface Technology Systems plc, a developer of plasma etch systems, has announced that it intends to build a Deep Reactive Ion Etch (DRIE) system suitable for 300-mm diameter wafers. The ...

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...

With advances in new technology it is getting more important to monitor all aspects of the influencing parameters in critical etch steps and utilize them as tuning knobs for within-wafer uniformity ...

Major processes in semiconductor wafer fabrication: 1) wafer preparation, 2) pattern transfer, 3) doping, 4) deposition, 5) etching, and 6) packaging. The process of creating semiconductors can be ...

Lam Research powers AI chipmaking with leading etch/deposition tools and recurring service revenue. Click here to find out ...

Etching is a method employed during the fabrication of semiconductors to chemically remove layers from the surface of the wafer substrate. Etching is a crucial process, and each wafer is subject to ...

Researchers at the Solar Energy Research Institute of Singapore (SERIS) at the National University of Singapore (NUS) have announced the development of a significantly low-cost technique to texture ...

OSAKA, Japan — Mitsubishi Electric Corp. has developed a single-step, hydrofluoric acid electrochemical etching process that can achieve an aspect ratio greater than 60:1 at potentially a tenth of the ...

Etching is a process that removes unwanted material from a wafer, which is also known as a "slice" or "substrate." Wafers are made of semiconducting material such as crystalline silicon and are used ...

AZoMaterials interviews Matt Wilding about how the EP-Replayer enables users to simulate previous etch runs in real time, helping them optimize End Point detection methods, and more. Can you start by ...