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New semiconductor etching process achieves five-fold speed improvement

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
Nature

Plasma Chemistry and Etching Processes in Semiconductor Fabrication

Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...
AZOM

Advancements in Plasma Etching and Deposition Processes for Compound Semiconductor Materials Applications

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...
AZoNano

Comparison of the Bosch and a Cryogenically Cooled Deep Silicon Etch Processes

In this technique, fluorine-based plasma chemistry is used for silicon etching, which is combined with a fluorocarbon plasma process to offer sidewall passivation and enhanced selectivity to masking ...
Semiconductor Engineering

Etch Processes Push Toward Higher Selectivity, Cost Control

Plasma etching is perhaps the most essential process in semiconductor manufacturing, and possibly the most complex of all fab operations next to photolithography. Nearly half of all fab steps rely on ...